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The interference of the incident wavefront with the reflected one forms an X-ray standing wave field which enhances the depth sensitivity of the setup.


In the case of well-defined and sharp interfaces, as e.g. in EUV lithography multilayer mirrors and other stratified nanomaterials, and under shallow incidence conditions, total external reflection can occur. This kind of experiments is called grazing incidence X-ray fluorescence (GIXRF), where the interference of the incident and reflected X-ray beam leads to the formation of the so-called X-ray standing wave field (XSW). The formation of the XSW can greatly enhance the spatial resolution of the technique, because the nodes and antinodes act as nano-scaled “X-ray sensors”, allowing to see changes in elemental distribution even in a sub-nanometer scale.



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Prof. Dr. Birgit Kanngießer
+49 (0)30-314 21428
Raum EW 346


Sekretariat EW 3-1

Sabine Remus
Raum EW 343