direkt zum Inhalt springen

direkt zum Hauptnavigationsmenü

Sie sind hier

TU Berlin

Inhalt des Dokuments

UHV spectroscopy chamber

UHV spectroscopy chamber with load lock system (left) and control unit (right)

A new multi-purpose and flexible laboratory measurement setup is build up for the analysis of nanomaterial, e.g. thin film solar cells. The functionality of those technological layers is determined by their chemical and physical characteristics driven by the elemental depth distribution.

In cooperation with the working group Röntgen- und IR-Spektroskopie of Physikalisch-Technische Bundesanstalt (PTB) in Berlin a new and flexible measurement chamber under Ultra High Vacuum (UHV) conditions was built up. The core of the chamber is a fully characterized 7-axes manipulator. Five axes (three translation and 2 rotation stages) are responsible for the sample positioning. The two remaining axes allow the rotational and translational movement of several photodiodes. With these degrees of freedom various analytical techniques can be realized, such as conventional and angle resolved XRF, total reflection XRF, reflectivity and transmission measurements.

The chamber can be used with several excitation sources. Two laboratory sources are accessible: an X-ray tube in combination with a polycapillary lens yielding a low divergence beam for an excitation spectrum in the hard X-ray region and on the other hand a Laser Produced Plasma (LPP) source with its most intensive excitation energies in the soft X-ray region at around 1 keV.  Furthermore the UHV chamber is designed for the optional operation at a synchrotron facility. This was already tested at the Plane Crystal Monochromator (PGM) beam line at Bessy II in the laboratories of the PTB.

A load lock system allows fast sample transfers within minutes. For the measurement period the UHV chamber itself stays under constant UHV conditions thereby minimizing possible unwanted contaminations on the sample surface.

As detection device an energy dispersive silicon drift detector (SDD) and a wavelength dispersive reflection grating spectrograph (RGS) are available. The second is optimized for the detection of soft X-ray radiation in the region between 200eV and 1200eV. Furthermore the use of an X-ray sensitive photo diode is feasible.

On the basis of the flexibility of the manipulator the UHV chamber is suited beside XRF measurements under grazing incident conditions also for  XRF measurements in conventional and grazing exit geometry and just as well for transmission or absorption experiments.

Point of ontact: Malte Spanier, Daniel Grötzsch

Related publication:

Lubeck, J.; Beckhoff, B.; Fliegauf, R.; Holfelder, I.; Hönicke, P.; Müller, M.; Pollakowski, B.; Reinhardt, F.; Weser, J. Review of Scientific Instruments, Volume: 84, Issue: 4 (2013)

Zusatzinformationen / Extras


Schnellnavigation zur Seite über Nummerneingabe